Tomohiro Kubota

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

5:15 PM - 5:30 PM

[19p-W621-11] Study of etching mechanism of transition metal using neutral beam enhanced complex reaction based on tight-binding quantum chemical molecular dynamics

〇Tomohiro Kubota¹, Hiroshi Ito², Momoji Kubo², Seiji Samukawa^1,3 (1.IFS, Tohoku Univ., 2.IMR, Tohoku Univ., 3.WPI-AIMR, Tohoku Univ.)

Mon. Mar 21, 2016 1:30 PM - 3:30 PM P5 (Gymnasium)

Poster presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[21p-P5-1~2] 8.4 Plasma etching

1:30 PM - 3:30 PM

[21p-P5-2] Effect of adsorption molecule on transition metal etching using neutral beam enhanced complex reaction

〇Tomohiro Kubota¹, Yoshiyuki Kikuchi², Hiroshi Ito³, Momoji Kubo³, Seiji Samukawa^1,4 (1.IFS, Tohoku Univ., 2.Tokyo Electron Ltd., 3.IMR, Tohoku Univ., 4.WPI-AIMR, Tohoku Univ.)

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