Yusuke Fukunaga

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

2:45 PM - 3:00 PM

[19p-W621-2] Dependence of wafer temperature on etch reaction by radical on organic film surfaces

〇Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)