[19p-W621-1~12] 8.4 Plasma etching

[19p-W621-2] Dependence of wafer temperature on etch reaction by radical on organic film surfaces

〇Yusuke Fukunaga¹, Takayoshi Tsutsumi¹, Keigo Takeda¹, Kenji Ishikawa¹, Hiroki Kondo¹, Makoto Sekine¹, Masaru Hori¹ (1.Nagoya Univ.)

Keywords:Substrate temperature effect,Organic film