The 63rd JSAP Spring Meeting, 2016

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8 Plasma Electronics » 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Hisataka Hayashi(TOSHIBA), Koji Eriguchi(Kyoto Univ.)

3:00 PM - 3:15 PM

[19p-W621-3] Substrate surface temperature measurement using Fourier transform infrared absorption spectroscopy during plasma etching

〇(D)Nobuya Nakazaki1, Daisuke Fukushima1, Hiroki Miyata1, Hirotaka Tsuda1, Yoshinori Takao1, Koji Eriguchi1, Kouichi Ono1 (1.Kyoto Univ.)

Keywords:plasma etching,substrate surface temperature measurement,Fourier transform infrared absorption spectroscopy