Noriko Miura

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 9:00 AM - 12:30 PM S423 (S4)

Oral presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19a-S423-1~13] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

9:45 AM - 10:00 AM

[19a-S423-4] Process of Thin Thermal Oxide Film Using a Minimal Focused Light Heating Furnace with a Sealed Chamber

〇Noriko Miura¹, Takeshi Yamada^1,2, Takeshi Aizawa^1,2, Shinichi Ikeda^1,3, Yuuki Ishida^1,3, Takanori Mikahara^1,3, Hiroshi Nishizato^1,4, Norio Umeyama^1,3, Yasuhiro Onishi^1,2, Sommawan Khumpuang^1,3, Shiro Hara^1,3 (1.MINIMAL, 2.YONEKURA, 3.AIST, 4.HORIBA STEC)

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