4:45 PM - 5:00 PM
[19p-H137-14] Latest Result of Extreme Ultra-Violet (EUV) Light Source for Semiconductor Lithography
〇Yuta Takashima1, Tsukasa Hori1, Yoshifumi Ueno1, Tamotsu Abe1, Takayuki Yabu1, Katsuhiko Wakana1, Yoshiaki Kato1, Tsutomu Kashiwazaki1, Osamu Fukuda1, Takahisa Fujimaki1, Yuichi Nishimura1, Rei Takenaka1, Toru Suzuki1, Masahiko Andou1, Hirokazu Hosoda1, Koutaro Miyashita1, Takayuki Osanai1, Takashi Saitou1, Hakaru Mizoguchi1 (1.Gigaphoton)