Yuji Kasashima

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Speaker, Author, Co-Author

Sat. Mar 19, 2016 2:30 PM - 5:45 PM W621 (W6)

Oral presentation
| 8 Plasma Electronics
| 8.4 Plasma etching

[19p-W621-1~12] 8.4 Plasma etching

4:15 PM - 4:30 PM

△ [19p-W621-7] Feasibility study of monitoring of inner walls of plasma etching chamber using load impedance monitoring system

〇Yuji Kasashima¹, Fumihiko Uesugi¹ (1.AIST)