SheikhRashel Al Ahmed

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 9:00 AM - 12:15 PM S221 (S2)

Oral presentation
| 13 Semiconductors
| 13.3 Insulator technology

[20a-S221-1~12] 13.3 Insulator technology

10:00 AM - 10:15 AM

▲ [20a-S221-5] Charge retention characteristics of charge trapping nonvolatile memories with silicon carbonitride (SiCN) dielectrics (II)

〇(D)SheikhRashel Al Ahmed¹, Fumiya Uehara², Kyoteru Kobayashi^1,2 (1.GRAD SCH S&T, Tokai Univ, 2.GRAD SCH Eng, Tokai Univ)