Tomohiro Takayama

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 9:30 AM - 12:00 PM S224 (S2)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

11:15 AM - 11:30 AM

△ [20a-S224-7] Dependence of exposure characteristics of polymer type electron beam resists on molecular weight

〇Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Ryoichi Hoshino², Atsushi Kawata² (1.Yamaguchi Univ., 2.LLC Gluon Lab)