Shunsuke Ochiai

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 9:30 AM - 12:00 PM S224 (S2)

Oral presentation
| 7 Beam Technology and Nanofabrication
| 7.3 Micro/Nano patterning and fabrication

[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

11:30 AM - 11:45 AM

△ [20a-S224-8] Exposure Characteristics of New Modacrylic Electron Beam Polymer Resist (Ⅱ)

〇Shunsuke Ochiai¹, Tomohiro Takayama¹, Yukiko Kishimura¹, Hironori Asada¹, Masashi Kunitake², Ryoichi Hoshino³, Atushi Kawata³ (1.Yamaguchi Univ., 2.Kumamoto Univ., 3.LLC Gluon Lab.)

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