Ryo Hirose

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 2:15 PM - 5:45 PM H113 (H)

Oral presentation
| 15 Crystal Engineering
| 15.8 Crystal evaluation, impurities and crystal defects

[20p-H113-1~13] 15.8 Crystal evaluation, impurities and crystal defects

3:30 PM - 3:45 PM

△ [20p-H113-6] Characteristics of Carbon Cluster Ion Implanted Epitaxial Silicon Wafers (6)
- Development study of multi-element molecular ion implantation technique -

〇Ryo Hirose¹, Ryosuke Okuyama¹, Takeshi Kadono¹, Yoshihiro Koga¹, Hidehiko Okuda¹, Kazunari Kurita¹, Naoki Miyamoto² (1.SUMCO Corp., 2.NISSIN ION EQUIPMENT Corp.)