atsushi seino

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 1:30 PM - 3:30 PM P9 (Gymnasium)

Poster presentation
| 13 Semiconductors
| 13.8 Compound and power electron devices and process technology

[20p-P9-1~22] 13.8 Compound and power electron devices and process technology

1:30 PM - 3:30 PM

[20p-P9-4] Effect of Insertion of Al₂O₃ Ultrathin Layer into PECVD SiO₂/InAlN Interface

〇(M1)atsushi seino¹, Taito Hasezaki¹, Naoshige Yokota¹, Masamichi Akazawa¹ (1.RCIQE Hokkaido Univ.)