Akira Narai

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 1:15 PM - 7:00 PM H103 (H)

Oral presentation
| 6 Thin Films and Surfaces
| 6.4 Thin films and New materials

[21p-H103-1~21] 6.4 Thin films and New materials

6:45 PM - 7:00 PM

[21p-H103-21] High-deposition rate reactive sputtering for Nickel compounds, which have electro-chromic properties, making use of water vapor

〇Akira Narai¹, Hiroki Wakamatsu², Shyun Yamauchi², Toshihiro Kugimiya¹, Yoshio Abe² (1.Kobe Steel Ltd., 2.Kitami Inst. Tech.)