Takafumi Ishibe

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 1:00 PM - 6:45 PM H111 (H)

Oral presentation
| 6 Thin Films and Surfaces
| 6.3 Oxide electronics

[21p-H111-1~22] 6.3 Oxide electronics

5:00 PM - 5:15 PM

[21p-H111-16] Effect of Ge nuclei size on epitaxial growth of iron oxide nanodots on Si substrate

〇(D)Takafumi Ishibe¹, Yoshiki Maeda¹, Hideki Matsui¹, Kentaro Watanabe¹, Nobuyasu Naruse², Yoshiaki Nakamura¹ (1.Osaka Univ., 2.Hokkaido Univ.)