Hiroyuki Koide

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 4:00 PM - 6:00 PM P17 (Gymnasium)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:00 PM - 6:00 PM

[21p-P17-10] Mn diffusion into porous SiOCH during CVD formation of a MnO_x diffusion barrier layer

〇Hiroyuki Koide¹, Hao Wang¹, Daisuke Ando¹, Yuji Sutou¹, Junichi Koike¹ (1.Tohoku Univ.)