Haochun Tang

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 4:00 PM - 6:00 PM P17 (Gymnasium)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:00 PM - 6:00 PM

▼ [21p-P17-20] Application of Supercritical Carbon Dioxide in Electroplating of Gold Materials Used in MEMS Devices

〇(D)Haochun Tang¹, Chun-Yi Chen^1,2, Tso-Fu Mark Chang^1,2, Katsuyuki Machida^1,2,3, Daisuke Yamane^1,2, Kazuya Masu^1,2, Masato Sone^1,2 (1.P&I Lab. Tokyo Tech, 2.CREST JST, 3.NTT AT Corp.)

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