Masahiro Koike

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Speaker, Author, Co-Author

Mon. Mar 21, 2016 4:00 PM - 6:00 PM P17 (Gymnasium)

Poster presentation
| 13 Semiconductors
| 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[21p-P17-1~26] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

4:00 PM - 6:00 PM

[21p-P17-7] Fabrication of n⁺poly-Ge film with high electron concentration and high electron mobility by Flash-lamp annealing (FLA)

〇Masahiro Koike^1,2, Koji Usuda^1,2, Yoshiki Kamata^1,2, Mori Takahiro^2,3, Tatsuro Maeda^2,3, Tsutomu Tezuka^1,2 (1.Toshiba Corp., 2.GNC, AIST, 3.AIST)