1:30 PM - 3:30 PM [21p-P3-19] Deposition of a-CNx:H films with hig nitrogen content from discharge plasma of organic vapor/N2 gasmixture - Structural analysis 〇Kenya Hiramatsu1, Hidetoshi Saitoh1, Haruhiko Ito1 (1.Nagaoka Univ. of Tech)