Toshiharu Kubo

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Speaker, Author, Co-Author

Tue. Mar 22, 2016 9:00 AM - 11:45 AM W541 (W5)

Oral presentation
| 13 Semiconductors
| 13.8 Compound and power electron devices and process technology

[22a-W541-1~10] 13.8 Compound and power electron devices and process technology

9:00 AM - 9:15 AM

[22a-W541-1] Estimation of ALD-HfO₂/AlGaN interface with post-deposition annealing by X-ray photoelectron spectroscopy using synchrotron radiation

〇Toshiharu Kubo¹, Gosuke Nishino¹, Takashi Egawa¹ (1.Nagoya Inst. Tech.)