Session information

Poster presentation

8 Plasma Electronics » 8.4 Plasma etching

[21p-P5-1~2] 8.4 Plasma etching

Mon. Mar 21, 2016 1:30 PM - 3:30 PM P5 (Gymnasium)

△：Young Scientist Oral Presentation Award Applied
▲：English Presentation
▼：Both Award Applied and English Presentation

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1:30 PM - 3:30 PM

[21p-P5-1] Fast local etching of Si substrates using inward plasma

〇Jun Miyawaki¹, Ryo Kanou², Hiroshi Suga², Toshitaka Kubo¹, Atsushi Ando¹, Satoshi Takahashi³, Shun'ichiro Shimbori³, Tetsuo Shimizu¹ (1.AIST, 2.CIT, 3.Sanyu Co.,Ltd.)

1:30 PM - 3:30 PM

[21p-P5-2] Effect of adsorption molecule on transition metal etching using neutral beam enhanced complex reaction

〇Tomohiro Kubota¹, Yoshiyuki Kikuchi², Hiroshi Ito³, Momoji Kubo³, Seiji Samukawa^1,4 (1.IFS, Tohoku Univ., 2.Tokyo Electron Ltd., 3.IMR, Tohoku Univ., 4.WPI-AIMR, Tohoku Univ.)

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