[19a-P1-1~17] 7 Beam Technology and Nanofabrication（Poster）

[19a-P1-10] Development of large scale ion sources with hollow cathode emitter

〇Taro Hayakawa¹, Tomokazu Nagao¹, Yutaka Inouchi¹ (1.Nissin Ion Equipment)

Keywords:silicon,doping,plasma

A large scale ion source with a hollow cathode emitter is successfully developed in order to make longer the cathode life of LTPS-TFT implantation tool. The ion source of 4th Generation glass size can generate 22.5 mA of PHx⁺ beam. We will report the extraction of B⁺ beam.