9:30 AM - 11:30 AM
[19a-P1-10] Development of large scale ion sources with hollow cathode emitter
Keywords:silicon,doping,plasma
A large scale ion source with a hollow cathode emitter is successfully developed in order to make longer the cathode life of LTPS-TFT implantation tool. The ion source of 4th Generation glass size can generate 22.5 mA of PHx+ beam. We will report the extraction of B+ beam.