[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

△ [19p-S423-1] Fabrication of metal-insulator-metal subwavelength grating using nanoimprint technique

〇Masato Mitsudome¹, Hiroaki Honma^1,2, Shintaro Itoh³, Makoto Ishida¹, Kazuaki Sawada¹, Kazuhiro Takahashi¹ (1.Toyohashi Tech. Univ., 2.JSPS Research Fellow DC2, 3.Nagoya Univ.)

Keywords:Nanoimprint,lift-off technique