Development of Water Plasma Asher Equipment for Minimal FAB.

TAKUYA KITANO; TAKUYA ITO; HIROAKI SUZUKI; TATSUO ISHIJIMA; YASUNORI TANAKA; YOSHIHIKO UESHUGI; SOMMAWAN KHUMPUANG; SHIRO HARA

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Oral presentation

13 Semiconductors » 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

[19p-S423-1~17] 13.4 Si wafer processing /Si based thin film /MEMS/Integration technology

Sat. Mar 19, 2016 1:45 PM - 6:15 PM S423 (S4)

Tomoji Nakamura(Fujitsu Lab.), Kuniyuki Kakushima(Titech)

2:00 PM - 2:15 PM

[19p-S423-2] Development of Water Plasma Asher Equipment for Minimal FAB.

〇(M1)TAKUYA KITANO¹, TAKUYA ITO¹, HIROAKI SUZUKI¹, TATSUO ISHIJIMA¹, YASUNORI TANAKA¹, YOSHIHIKO UESHUGI¹, SOMMAWAN KHUMPUANG², SHIRO HARA² (1.Kanazawa Univ., 2.AIST)

Keywords:microwave plasma,photoresist removing,minimal

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