2016年第63回応用物理学会春季学術講演会

講演情報

シンポジウム(口頭講演)

シンポジウム » 偏光計測制御の新展開

[19p-S621-1~9] 偏光計測制御の新展開

2016年3月19日(土) 13:30 〜 17:15 S621 (南6号館)

大谷 幸利(宇都宮大)、岡 和彦(北大)

17:00 〜 17:15

[19p-S621-9] A partial Mueller matrix polarimeter using two photoelastic modulator and polarizer pairs

〇(B)Tipol Nia Natasha1、Kawabata Shuichi2、Otani Yukitoshi1 (1.Utsunomiya Univ. for Utsunomiya University、2.Tokyo Polytechnic Univ. for Tokyo Polytechnic University)

キーワード:mueller matrix,photoelastic modulator

The theoretical approach is presented for measuring the partial Mueller matrix of a sample by using two photoelastic modulator-polarizer pairs, where the photoelastic modulators are operating at different resonant frequencies. The two PEMs in the instrument are oriented 45° apart. From the given configuration, partial Mueller matrix in terms of the output light intensity of the light beam can be defined.