The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[20a-H101-1~10] 15.6 Group IV Compound Semiconductors (SiC)

Sun. Mar 20, 2016 9:00 AM - 11:45 AM H101 (H)

Katsunori Danno(Toyota Motor Co.)

9:00 AM - 9:15 AM

[20a-H101-1] Effect of Supersaturation of SiC on Growth Rate in Solution Growth of SiC Single Crystal Using Cr Solvent

Ryo Miyasaka1, Taka Narumi1, Sakiko Kawanishi2,3, Hideaki Sasaki2, Takeshi Yoshikawa2, Masafumi Maeda2 (1.Univ. of Tokyo, 2.IIS, Univ. of Tokyo, 3.IMRAM, Tohoku Univ.)

Keywords:silicon carbide,solution growth,supersaturation

Solution growth of SiC single crystal using Cr solvent was expected to realize the rapid growth according to the remarkably high solubility of carbon in molten Cr. It was found that supersaturation of carbon at the growth interface strongly affected on the growth rate of SiC and it was suggested that the less ratio of supersaturation to solubility made the interface smoother.