The 63rd JSAP Spring Meeting, 2016

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Oral presentation

15 Crystal Engineering » 15.5 Group IV crystals and alloys

[20a-H112-1~10] 15.5 Group IV crystals and alloys

Sun. Mar 20, 2016 9:00 AM - 11:30 AM H112 (H)

Masashi Kurosawa(Nagoya Univ.)

11:15 AM - 11:30 AM

[20a-H112-10] Study on ion implantation conditions in fabricating compressively strained Si/relaxed Si1-xCx heterostructures utilizing the defect control by ion implantation

〇You Arisawa1, Kentarou Sawano2, Noritaka Usami1 (1.Nagoya Univ., 2.Tokyo City Univ.)

Keywords:strained Si,ion implantation,group IV alloy