You Arisawa

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Speaker, Author, Co-Author

Sun. Mar 20, 2016 9:00 AM - 11:30 AM H112 (H)

Oral presentation
| 15 Crystal Engineering
| 15.5 Group IV crystals and alloys

[20a-H112-1~10] 15.5 Group IV crystals and alloys

11:15 AM - 11:30 AM

[20a-H112-10] Study on ion implantation conditions in fabricating compressively strained Si/relaxed Si_1-xC_x heterostructures utilizing the defect control by ion implantation

〇You Arisawa¹, Kentarou Sawano², Noritaka Usami¹ (1.Nagoya Univ., 2.Tokyo City Univ.)