The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.8 Crystal evaluation, impurities and crystal defects

[20a-H113-1~12] 15.8 Crystal evaluation, impurities and crystal defects

Sun. Mar 20, 2016 9:30 AM - 12:45 PM H113 (H)

Kentaro Kutsukake(Tohoku Univ.), Yuta Nagai(GlobalWafers Japan)

9:30 AM - 9:45 AM

[20a-H113-1] Thermal equilibrium point defects in silicon: Frenkel pairs or Schottky defects?

Masashi Suezawa1, Yoshiaki Iijima1, Ichiro Yonenaga1 (1.I.M.R.,Tohoku Univ.)

Keywords:silicon,Frenkel pair,Scottky defect

It is still controversial that the nature of thermal equilibrium point defect in silicon is the Frenkel pair or the Schottky defect. We review models so far proposed and conclude that it is the Schottky defect based on our experimental results on the formation energy of point defects.