The 63rd JSAP Spring Meeting, 2016

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7 Beam Technology and Nanofabrication » 7.3 Micro/Nano patterning and fabrication

[20a-S224-1~9] 7.3 Micro/Nano patterning and fabrication

Sun. Mar 20, 2016 9:30 AM - 12:00 PM S224 (S2)

Toshiyuki Horiuchi(Tokyo Denki Univ.), Satoshi Tanaka(EIDEC)

9:30 AM - 9:45 AM

△ [20a-S224-1] Development of a transmittance measurement method for EUV resist using a photodiode

〇Daiki Mamezaki1, Masanori Watanabe1, Haruki Iguchi1, Tetsuo Harada1, Takeo Watanabe1 (1.University of Hyogo)

Keywords:EUV lithography,EUV resist,Synchrotron