The 63rd JSAP Spring Meeting, 2016

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6 Thin Films and Surfaces » 6.2 Carbon-based thin films

[20p-H103-1~21] 6.2 Carbon-based thin films

Sun. Mar 20, 2016 1:15 PM - 7:00 PM H103 (H)

Masami Aono(National Defence Academy), Takako Nakamura(AIST), Atsuhito Sawabe(Aoyama Gakuin Univ.)

6:15 PM - 6:30 PM

[20p-H103-19] Field Electron Emission from SiO2/a-CNx:H Multi-Layer Films Deposited on Al Films

〇Haruhisa Kinoshita1, Yoku Murayama1, Ken Matsumoto1 (1.Shizuoka Univ.)

Keywords:supermagnetron plasma

Using pulsed-RF supermagnetron plasma CVD, a-CNx:H films were deposited on Al Films, which were applied to field electron emission devices. These a-CNx:H films showed electro-conductive and were suited to plane-type field emitters. In this study, we deposited multi-layer stuctures of SiO2/a-CNx:H on Al films, and whose electron emission characteristics were investigated.