The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.4 III-V-group nitride crystals

[20p-H121-1~24] 15.4 III-V-group nitride crystals

Sun. Mar 20, 2016 1:15 PM - 7:45 PM H121 (H)

Tsutomu Araki(Ritsumeikan Univ.), Mitsuru Funato(Kyoto Univ.), Takeyoshi Onuma(Kogakuin Univ.)

3:45 PM - 4:00 PM

[20p-H121-10] Lateral satellite peaks originating from confined misfit dislocations in HRXRD study of AlN layer grown on step-height-controlled SiC substrates

Mitsuaki Kaneko1, Tsunenobu Kimoto1, Jun Suda1 (1.Kyoto Univ.)

Keywords:Nitride semiconductor,X-ray diffraction,Silicon Carbide

Lateral satellite peaks in XRD are often observed from lattice-relaxed heterostructures which include long misfit dislocations confined at their interfaces, such as AlAs/GaAs or PbSe/PbTe. On the other hand, III-nitride semiconductors are usually grown on strongly lattice-mismatched substrates, such as sapphire or Si, and such a confinement of misfit dislocations is quite difficult. In this study, we firstly report the observation of lateral satellite peaks among nitride semiconductors in a high-quality AlN layer grown on a step-height-controlled SiC substrate.