[20p-H137-1~15] 7.5 Ion beams

[20p-H137-1] Development on Intensive Ion Source of Size-selected Nanoclusters Based on High-power Impulse Magnetron Sputtering Method

〇Hironori Tsunoyama^1,2, Chuhang Zhang², Hiroaki Yamamoto³, Masahide Tona³, Keizo Tsukamoto³, Atsushi Nakajima^1,2,4 (1.Keio Univ., 2.JST-ERATO, 3.Ayabo Corp., 4.KiPAS)

Keywords:nanocluster,magnetronsputtering

Nanoclusters (NCs) consisting of several to several hundreds atoms are strong potential candidates for future functional nanomaterials due to their unique, size-specific properties. We developed an intensive, ion source of size-selected NCs (Nanojima) based on high-power impulse magnetron sputtering method. The NC ion source exhibits following two advantages; (1) facile tuning of size-distribution of NCs by characteristics of discharge pulse (e.g. peak power and repetition rate), (2) increase of ion intensity from conventional direct-current MSP.