[20p-H137-1~15] 7.5 Ion beams

[20p-H137-2] Creation and Characterization of Metal Atom Encapsulating Silicon Nanoclusters

〇Atsushi Nakajima^1,2,3, Masahiro Shibuta², Masato Nakaya^1,3, Tsutomu Ohta¹, Hironori Tsunoyama^1,3, Toyoaki Egushi^1,3 (1.Keio Univ. Faculty of Sci. & Tech., 2.KiPAS, 3.JST-ERATO)

Keywords:nanocluster,magnetron sputtering,superatom

Metal and silicon mixed nanoclusters were generated using an intensive, ion source of size-selected NCs (Nanojima) based on high-power impulse magnetron sputtering method. With the size selection mass-spectroscopically, nanoclusters consisting of one tantalum and sixteen silicon atoms, TaSi₁₆, were deposited on to a substrate, and morphology and chemical stability were evaluated with scanning probe microscopy and photoemission spectroscopy, revealing that Ta@Si₁₆ is a binary superatom.