The 63rd JSAP Spring Meeting, 2016

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Oral presentation

13 Semiconductors » 13.3 Insulator technology

[20p-S221-1~17] 13.3 Insulator technology

Sun. Mar 20, 2016 1:45 PM - 6:15 PM S221 (S2)

Takanobu Watanabe(Waseda Univ.), Hiroshi Funakubo(Titech)

6:00 PM - 6:15 PM

[20p-S221-17] Decay of polarization domain in ferroelectric HfO2 film

〇Shigehisa Shibayama1,2, Lun Xu1, Shinji Migita3, Akira Toriumi1 (1.The Univ. of Tokyo, 2.JSPS research fellow, 3.AIST)

Keywords:HfO2,ferroelectric,PFM