The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

3 Optics and Photonics » 3.13 Semiconductor optical devices

[20p-S321-1~16] 3.13 Semiconductor optical devices

Sun. Mar 20, 2016 1:45 PM - 6:00 PM S321 (S3)

Tomoyuki Miyamoto(Titech), Takahiro Kitada(Tokushima Univ)

2:00 PM - 2:15 PM

[20p-S321-2] Analysis of Electrode Structure and Process for High-Power AlGaN-based Deep-Ultraviolet Light-Emitting Diodes

Guodong HAO1, Manabu Taniguchi1, Naoki Tamari1,2, Shin-ichiro Inoue1,3 (1.NICT, 2.Tokuyama Corp., 3.JST-PREST)

Keywords:DUV-LED,current crowding,current uniform

AlGaN-based deep-ultraviolet light-emitting diodes (DUV-LEDs) are undergoing a rapid evolution in recent years. Several groups reported the external quantum efficiency (EQE) in the 270-280 nm spectral range has exceed 10%. We recently demonstrated a record output power exceed 90 mW with an emission of 265 nm These are the highest EQE and output power reported to date for DUV-LEDs emission shorter than 280 nm. However, these values are still much lower than that achieved in the visible spectral range, and further improvement is required. Here, we report on a dramatically enhancement in wall-plug efficiency (WPE) with an improvement in the output power and a reduction of the operating voltage by using a well-designed p-electrode and an optimal annealing temperature in LED fabrication process.