The 63rd JSAP Spring Meeting, 2016

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[21a-H103-1~10] 6.4 Thin films and New materials

Mon. Mar 21, 2016 9:00 AM - 11:45 AM H103 (H)

Motofumi Suzuki(Kyoto Univ)

9:00 AM - 9:15 AM

[21a-H103-1] Crystallization suppression of CeO2 thin films deposited by MOCVD by additional TEOS introduction

〇Tomonari Furuya1, Takashi Matsumura1, Kensuke Kikuchi1, Yuta Suzuki1, Setsu Suzuki2, Keiji Ishibashi2, Yasuhiro Yamamoto1 (1.Hosei Univ., 2.Comet Inc.)

Keywords:dielectrics,MOCVD,CeO2