The 63rd JSAP Spring Meeting, 2016

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6 Thin Films and Surfaces » 6.4 Thin films and New materials

[21a-H103-1~10] 6.4 Thin films and New materials

Mon. Mar 21, 2016 9:00 AM - 11:45 AM H103 (H)

Motofumi Suzuki(Kyoto Univ)

9:30 AM - 9:45 AM

[21a-H103-3] Electrical properties of Al2O3 - CeO2 combinatorial thin films deposited by magnetron sputtering

〇Junya Konishi1, Takashi Ohsawa1, Akihiro Tanaka1, Takumi Makiishi1, Setsu Suzuki2, Keiji Ishibashi2, S.-G Ri2, Kenichiro Tkahashi2, Yasuhiro Yamamoto1 (1.Hosei Univ., 2.Comet Inc.)

Keywords:dielectric material,high-k film,CeO2