11:30 AM - 11:45 AM
▼ [21a-S422-8] Realization of Ge n- and p-MOSFETs by using low thermal budget ionimplantation after germanidation technique (< 400 °C)
Keywords:Ge,MOSFET,CMOS
Oral presentation
13 Semiconductors » 13.5 Semiconductor devices and related technologies
Mon. Mar 21, 2016 9:00 AM - 12:15 PM S422 (S4)
Ken Uchida(Keio Univ.), Tetsuo Endoh(Tohoku Univ.)
11:30 AM - 11:45 AM
Keywords:Ge,MOSFET,CMOS