[21p-H101-1~10] Women in Applied Physics - Part4: Plasma Electronics -

[21p-H101-8] Characterization of Plasma Etching Damage in Semiconductor Materials by using DLTS

〇Wakana Takeuchi¹, Kusuma ndari¹, Mitsuo Sakashita¹, Osamu Nakatsuka¹, Yutaka Tokuda², Shigeaki Zaima^1,3 (1.Grad. Sc. Eng., Nagoya Univ., 2.Aichi Inst. of Tech., 3.IMaSS, Nagoya Univ.)

Keywords:semiconductor,damage of plasma etching,DLTS