[21p-H103-1~21] 6.4 Thin films and New materials

[21p-H103-21] High-deposition rate reactive sputtering for Nickel compounds, which have electro-chromic properties, making use of water vapor

〇Akira Narai¹, Hiroki Wakamatsu², Shyun Yamauchi², Toshihiro Kugimiya¹, Yoshio Abe² (1.Kobe Steel Ltd., 2.Kitami Inst. Tech.)

Keywords:Electrochromic,reactive sputtering,Nickel compounds

Recently, “electrochromism” is considered to be an important technology, which can display alternate optical properties with the use of a minimal amount of electricity. For instance, if electro-chromic properties are applied to a “Smart Window”, considerable savings can be achieved regarding the amount of heating or cooling energy required for buildings.In this study, the reactive sputtering method, which can be achieved high deposition rate, was employed for synthesis of the Nickel compounds layer, making use of water vapor.However the water vapor plasma was unstable, because it contains various kinds of species, which may include negative ions. In this study we will talk about “stabilize method for water vapor plasma” and the electro-chemical properties of the Nickel compounds layer.