2016年第63回応用物理学会春季学術講演会

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一般セッション(口頭講演)

6 薄膜・表面 » 6.4 薄膜新材料

[21p-H103-1~21] 6.4 薄膜新材料

2016年3月21日(月) 13:15 〜 19:00 H103 (本館)

遠藤 民生(岐阜大)、名村 今日子(京大)、永田 知子(日大)

14:00 〜 14:15

[21p-H103-4] Thickness dependence of epitaxially grown cobalt ferrite (111) thin films on
sapphire (0001) substrate using RF sputtering

〇(D)Patel Ritesh1、Tainosho Takeshi1、Hisamatsu Yuki1、Sharmin Sonia1、Yanagihara Hideto1、Kita Eiji1 (1.Institute of Applied Physics, University of Tsukuba)

キーワード:Thin films,Oxide materials,Thickness dependence

Cobalt ferrite (CFO) thin films are good candidates for high density magnetic recording, spin filtering, and spintronic device applications. Previous reports showed that the cobalt ferrite (CFO) (111) thin films grown by different methods present complexities with regard to thin film quality and magnetic properties. This suggests that the magnetic properties of the CFO (111) film are dependent on film thickness and deposition parameters. In this study, we report the magnetic properties of CFO (111) thin films of different thickness grown on α-Al2O3 (0001). The purpose of this research is to understand thickness dependence behavior of the CFO (111) thin films.