The 63rd JSAP Spring Meeting, 2016

Presentation information

Oral presentation

15 Crystal Engineering » 15.3 III-V-group epitaxial crystals

[21p-H112-1~13] 15.3 III-V-group epitaxial crystals

Mon. Mar 21, 2016 1:15 PM - 4:45 PM H112 (H)

Tomoyuki Miyamoto(Titech)

3:00 PM - 3:15 PM

[21p-H112-7] Effect of annealing on crystalline quality of MOVPE grown GaAs/Ge/Si structure

Ryo Nakao1,2, Masakazu Arai1,2, Tsuyoshi Yamamoto1, Shinji Matsuo1,2 (1.NTT Device Technology Labs, 2.Nanophotonics Center)

Keywords:epitaxial growth

We confirmed that the pit-density reduction and photoluminescence intensity increasing by using thermal cycle annealing on MOVPE-grown GaAs/Ge/Si structure.