[21p-H116-1~22] 3.8 Optical measurement, instrumentation, and sensor

[21p-H116-2] The development of thin film metrology by coherence scanning interferometry

〇Hirokazu Yoshino¹, Daniel Mansfield², Roger Smith¹, Michael Walls¹ (1.Loughborough Univ., 2.Taylor Hobson Ltd)

Keywords:Coherence Scanning Interferometry,Thin film,Ellipsometry

Coherence Scanning Interferometry (CSI) is well-established as a powerful tool for sub-nanometre surface metrology. This non-contact technique provides accurate and rapid three dimensional topographical analysis. This presentation will focus on validating the CSI performance for surface roughness measurements by comparison with a stylus instrument. Recent developments of CSI using the Helical Complex Field (HCF) function will also be presented. These developments now enable CSI to perform thin film thickness measurements, to measure the interfacial surface topography of a buried interface and derive a spectral complex refractive index of surfaces of absorbing materials.