The 63rd JSAP Spring Meeting, 2016

Presentation information

Poster presentation

15 Crystal Engineering » 15.6 Group IV Compound Semiconductors (SiC)

[21p-P10-1~24] 15.6 Group IV Compound Semiconductors (SiC)

Mon. Mar 21, 2016 1:30 PM - 3:30 PM P10 (Gymnasium)

1:30 PM - 3:30 PM

[21p-P10-19] Optimum Structures for Gamma-ray Radiation Resistant SiC-MOSFETs

〇(M1)satoshi mitomo1,2, Takuma Matsuda1,2, Koichi Murata1,2, Takashi Yokoseki1,2, Takahiro Makino2, Akinori Takeyama2, Shinobu Onoda2, Takeshi Ohshima2, Syuichi Okubo3, Yuki Tanaka3, Mikio Kandori3, Toru Yoshie3, Yasuto HIjikata1 (1.Saitama Univ., 2.JAEA, 3.Sanken Electric Co., Ltd.)

Keywords:SiC MOSFET,gamma-ray,oxide thickness

We investigated the oxide thickness dependence of gamma-ray irradiation response on SiC MOSFETs to optimize the structures of them.The Vth of bigger oxide thickness felt in normally-on at fewer dose than that of smaller one. Thickness of gate oxide of SiC MOSFET influences the radiation tolerance and, in addition, the smaller thickness has a higher radiation tolerance.