[21p-S011-1~20] 17.2 グラフェン

[21p-S011-15] HIMを用いたサブ10 nm 幅サスペンデッドグラフェンナノリボンの作製

シュミット マレク¹、〇武市 旺大¹、神崎 晃悠¹、小川 真一²、水田 博^1,3 (1.北陸先端大、2.産総研、3.サザンプトン大)

キーワード：グラフェン、サスペンデッド、ヘリウムイオン顕微鏡

Helium ion microscopy (HIM) and milling are known for highest resolution. It is therefore actively employed for graphene device fabrication and modification. However, when the necessary dose to modify the graphene exceeds a certain value, the substrate starts to swell due to helium bubble formation. This deformation can cause damage to the graphene and methods to mitigate this are actively searched. Here, we avoid damage from substrate swelling by suspending the graphene. Additionally, knock-on damage from the beam-substrate interaction is reduced, leading to sub-10 nm resolution.