2016年第63回応用物理学会春季学術講演会

講演情報

一般セッション(口頭講演)

10 スピントロニクス・マグネティクス » 10.2 スピントルク・スピン流・回路・測定技術

[21p-W241-1~21] 10.2 スピントルク・スピン流・回路・測定技術

2016年3月21日(月) 13:15 〜 19:00 W241 (西2・3号館)

齋藤 秀和(産総研)、工藤 究(東芝)

13:30 〜 13:45

[21p-W241-2] Effect of post annealing on spin accumulation and transport signals in Co2FeSi/MgO/n+-Si on insulator devices

Tiwari Ajay1、Inokuchi Tomoaki1、Ishikawa Mizue1、Sugiyama Hideyuki1、Saito Yoshiaki1 (1.Toshiba Corporation)

キーワード:Semiconductor spintronics,Spin injection,Spin accumulation

The post annealing temperature dependence of spin accumulation and transport signals in Co2FeSi/MgO/n+-Si on insulator were investigated. The spin signals were detected using 3-terminal Hanle, 2-terminal local and 4-terminal nonlocal measurements. The all spin signals slightly increase with increasing annealing temperature with a peak at around 350°C and then start slightly decreasing. The improvement in the spin signal is probably due to high polarization of Co2FeSi as a result of structural ordering. The spin signal does not vary significantly by annealing, indicating the robustness of our device. This result would be useful for future spintronics devices.