[22a-P4-1~27] 6.3 Oxide electronics

[22a-P4-11] Electrical and Structural Properties of Nd_1-xSr_xFeO_3-d Thin Film Prepared by RF Magnetron Sputtering

Wataru Namiki¹, Naoya Suzuki¹, Takuya Nakano¹, Takashi Tsuchiya¹, Masaki Kobayashi², Hiroshi Kumigashira², 〇Tohru Higuchi¹ (1.Tokyo Univ. Sci., 2.PF, KEK)

Keywords:Nd1-xSrxFeO3 thin film,metal-insulator transition

We have prepared the Nd_1-xSr_xFeO₃ (x = 0~1.0) thin film by RF magnetron sputtering using ceramics target. The thin films were charcterized by XRD, AC impedance method and soft-X-ray spectroscopy. The lattice constant and electrical conductivity strongly depend on Sr concentration and film thickness. In this presentation, we will discuss the details of electrical and structural properties in commparison with La_1-xSr_xFeO₃ thin film.