The 63rd JSAP Spring Meeting, 2016

Presentation information

Poster presentation

6 Thin Films and Surfaces » 6.3 Oxide electronics

[22a-P4-1~27] 6.3 Oxide electronics

Tue. Mar 22, 2016 9:30 AM - 11:30 AM P4 (Gymnasium)

9:30 AM - 11:30 AM

[22a-P4-10] Metal-insulator Transition of Valence-controlled VO2 Thin Film

Tomohiro Tannno1, Takaaki Suetsugu1, Takashi Tsuchiya1, Masaki Kobaayshi2, 〇Tohru Higuchi1, Hiroshi Kumigashira2 (1.Tokyo Univ. Sci., 2.PF, KEK)

Keywords:VO2,metal-insulator transition

We have prepared the VO2 thin films on MgO and Al2O3 substrates by RF magnetron sputtering and characterized their structural and electrical properties. The metal-insulator transition temperature and electrical resistivity strongly depend on lattice distortion and valence state. Furthermore, the changes of bandwidth and electron correlation energy were also observed by soft-X-ray spectroscopy.