[22a-S222-1~8] 21.1 Joint Session K

[22a-S222-8] Room temperature fabrication of phosphor thin films based on amorphous oxide semiconductors

〇Toshio Kamiya^1,2, Junghwan Kim¹, Norihiko Miyokawa¹, Keisuke Ide¹, Yoshitake Toda², Hidenori Hiramatsu^1,2, Hosono Hideo^1,2 (1.MSL, Tokyo Tech, 2.MCES, Tokyo Tech)

Keywords:phosphor thin film,amorphous oxide semiconductor

We propose a thin film phosphor fabricatable at room tempeature on glass. In this study, we observed strong red emission from a-In-Ga-Zn-O:Eu films deposited at room temperature on glass. The emission mechanism and the electronic structure will be discussed at the meeting.